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TISI ID Manufacturer Model Description Wafer Size Vintage Q.ty Sales
cond.		 Lead Time
20171201-284 Novellus Sabre XT 8 1999 As-is Were-is Immediately
20171201-163 Hugle CRD-1000 6 - As-is Were-is Immediately
20171201-120 DNS MP-3000 12 2003 As-is Were-is Immediately
20171201-119 DNS FC-3000 12 2003 As-is Were-is Immediately
20171121-119 Tech Japan TR 1500SX 8 1 As-is Were-is Immediately
20171121-118 Tech Japan TR 1500SX 8 1 As-is Were-is Immediately
20171102-03 DNS SU-3100 300 2007 1 As-Is Where-Is Immediately
20171102-02 DNS FC3100 300 2006 1 As-Is Where-Is Immediately
20171102-01 DNS FC3100 300 2007 1 As-Is Where-Is Immediately
20151106-351 TOYOKO KAGAKU XE5-¥± Wet etching system £¨AL£© 1996 1 As-is Where-is Immediately
20151106-350 TOYOKO KAGAKU - Wet etching system £¨SiN£© 2005 1 As-is Where-is Immediately
20151106-349 TOYOKO KAGAKU - Wet etching system £¨SiN£© 1998 1 As-is Where-is Immediately
20151106-347 TOYOKO KAGAKU WET station Wet etching system £¨SiO2£© 1999 1 As-is Where-is Immediately
20151106-346 ECHO GIKEN ERRA-34265 Resist stripping system £¨amine£© 1994 1 As-is Where-is Immediately
20151106-345 SCREEN X£Ó4-¥° Resist stripping system £¨organic solvent£© 1985 1 As-is Where-is Immediately
20151106-342 TOYOKO KAGAKU - Wet cleaning £¨Pure Water£© 1990 1 As-is Where-is Immediately
20151106-340 ECHO GIKEN - Wet cleaning £¨Pure Water£© 1989 1 As-is Where-is Immediately
20151106-339 SCREEN - Wet cleaning £¨APM/SPM£© 1991 1 As-is Where-is Immediately
20151106-338 KAIJO XA5-¥± Wet cleaning £¨APM£© 1984 1 As-is Where-is Immediately
20151106-336 TOYOKO KAGAKU WET station Wet etching system £¨SiO2£© 1985 2 As-is Where-is Immediately
 
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