Front End Equipment  |  Back End Equipment  |  Spare Parts   All Equipment   -   CVD Equipment   -   PVD Equipment   -   Etch Equipment   -   Diffusion Equipment   -   Photo Equipment   -   Ion Implantation Equipment   -   RTP Equipment   -   EPI Equipment   -   Metrology Equipment   -   Wet Cleaning Equipment   -   CMP Equipment   -   Others TISI ID Manufacturer Model Wafer Size TISI ID Manufacturer Model Description Wafer Size Vintage Q.ty Sales cond. Lead Time 20171201-75 AMAT AMC7800RPX 6 1982 As-is Were-is Immediately 20171201-03 AG Associates HeatPulse 8800 8 2000 As-is Were-is Immediately 20171201-02 AG Associates HeatPulse 4100 6 1989 As-is Were-is Immediately 20171121-114 NIDEC SD103 1 As-is Were-is Immediately 20171121-113 DNS OVEN 6 1991 1 As-is Were-is Immediately 20171121-112 DNS LAW-815A 6 1993 1 As-is Were-is Immediately 20171121-111 DNS LAW-815A 6 1993 1 As-is Were-is Immediately 20171121-110 DNS LAW-815A 6 1993 1 As-is Were-is Immediately 20171121-109 DNS LAW-815A 6 1993 1 As-is Were-is Immediately 20171121-108 DNS LAW-820 6 1995 1 As-is Were-is Immediately 151130-89 ` ` OVEN 6 1991 1 As-is Where-is `Immediatley 151130-88 DNS LAW-820 6 1993 1 As-is Where-is `Immediatley 151130-87 DNS LAW-815A 6 1993 3 As-is Where-is `Immediatley 151130-86 DNS LAW-820 DNS 6 1995 1 As-is Where-is `Immediatley 150916-81 ` OVEN 6 1991 1 As-is Where-is Immediately 150916-80 DNS LAW"820 infrared ray Lamp Anneal Machine 6 1993 1 As-is Where-is Immediately 150916-79 DNS LAW"815A infrared ray Lamp Anneal Machine 6 1993 3 As-is Where-is Immediately 150916-78 DNS LAW"820 infrared ray Lamp Anneal Machine 6 1995 1 As-is Where-is Immediately 150815-89 MATTSON AST 2800E Rapid Thermal Processor 4" 3 As-is Where-is Immediately 150815-88 KORNIC(AP system) RTP-600M RTP, wafer diffusion 4", 6" 1 As-is Where-is Immediately     1 / 2 / 3 / 4 /